21st International Conference on Modeling and Analysis of Semiconductor Manufacturing (MASM)
Seattle, WA
December 7-10, 2025
Part of the Winter Simulation Conference (WSC) 2025
The International Conference on Modeling and Analysis of Semiconductor Manufacturing (MASM) is an annual forum for the exchange of ideas and industrial innovations between researchers and practitioners from around the world involved in modelling and analysis of complex high-tech manufacturing systems.
The MASM Conference is fully contained within the Winter Simulation Conference (WSC), the world-leading conference for Discrete Event Simulation, but covers a much wider range of techniques and approaches that also include optimization, scheduling, queueing theory, process control, data analysis and machine learning. It features a comprehensive program ranging from state-of-the-art research to recent case studies demonstrating the relevance of these techniques for Smart Manufacturing.
The MASM 2025 conference will take place at the Sheraton Grand Seattle in Seattle, Washington USA. The hotel is located in the heart of downtown Seattle within walking distance to Pike Market and Seattle Waterfront. The WSC keynote presentation will be given by the Chief of the Simulation and Graphics Branch at NASA.
For 2025 we are asking not just for Full Research Papers but also for relevant Industrial Case Studies illustrating the benefits that have been achieved with novel methodologies and solutions. These Industrial Case Study presentations will be fully integrated into the respective MASM application track but will only require a 2-page “Extended Abstract” and have shorter submission lead times to facilitate participation from the industry. Unlike Full Research Papers, Extended Abstracts will appear only in the INFORMS Simulation Society archives but not in the ACM and IEEE digital proceedings.
We are looking for high-quality academic and applied research and relevant industrial case studies at all levels of Semiconductor Manufacturing.
At the equipment and process level, we cover various aspects of Equipment Maintenance and Productivity, Quality and Advanced Process Control (Statistical Process Control, Fault Detection and Classification, Run To Run, Virtual Metrology, etc.), but also how to handle and exploit the huge amount of data generated in wafer fabs (Big Data). As such we also invite submissions from leading Semiconductor Equipment Manufacturers.
At the shop-floor level, optimized WIP management, dispatching, scheduling and sampling of lots or qualification management of products on machines remain critical, in particular when handling complex constraints.
At the factory level, it is important to develop efficient transportation and storage policies, production and capacity planning approaches, in order to reduce cycle times and time-to-market.
At the strategic level, demand planning, factory economics and cost modelling, new product introduction, and supply chain efficiency are important topics to support the business.
We invite participants to present on all topics related to modeling and analysis that will help address these challenges. We also welcome contributions that integrate decisions or information at different decision levels which is becoming a must. These various goals will be attained through new advanced control and statistical methods, novel computing techniques, methods from artificial intelligence, and operations research methods
While the MASM Conference is mostly focused on the current semiconductor industry state-of-the-art, neither presenters nor attendees need to be in the IC industry to participate. We are interested in methodologies, research and/or applications from other related industries such as TFT-LCD, flexible displays, bio-chip, solid state lighting (LED), and photovoltaic (PV) that might also share or want to share common and new practices. Interested individuals within academia, government agencies, equipment suppliers, manufacturers, students, contractors, and other interested parties are encouraged to participate.
All attendees of the MASM Conference will register for Winter Simulation Conference at the same cost. In turn, all participants of WSC can attend the respective MASM sessions.
Each accepted paper and case study presentation must have a separate, paid registration. Only under highly unusual circumstances, and at the discretion of the conference leadership, will an author be allowed to present more than one paper on a single registration. Authors wishing to do so must contact the Program Chair by September 1, clearly describing which papers the authors wish to present under the single registration, and why an exception to the conference policy is warranted. Unless permission is granted, an author planning to present two papers will be required to pay for two registrations.
Authors of high-quality submissions of Full Research Papers will also have the opportunity to submit considerably extended versions of their MASM contributions to IEEE Transactions on Semiconductor Manufacturing.
Important Dates
Full Research Papers:
March 1, 2025: Submission open
April 4, 2025: Submissions due for Contributed Papers using the 2025 Authors Kit available here
April 25, 2025 : Submissions due for Invited Papers using the 2025 Authors Kit available here
June 2, 2025: Notification of acceptance
June 27, 2025: Authors electronically submit fully corrected (camera-ready) papers for review by the Proceedings Editors
Extended Abstracts for Industrial Case Studies:
May 5, 2025: Submission open for extended abstracts
August 1, 2025: Electronically submit 2-page extended abstracts using the 2025 Authors Kit available here
September 1, 2025: Notification of acceptance to authors (including details about submitting slides, and formats of the posters
September 12, 2025: Final camera-ready extended abstracts due
Please follow the 2025 WSC Author Kit to prepare your MASM 2024 Paper or Extended Abstract.
Conference Organizers
- John W. Fowler, Arizona State University, USA
- Lars Mönch, University of Hagen, Germany
International Program Committee
Coming Soon